High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing
- High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing
- 손정곤; Kevin Gotirk; Caroline Ross
- Issue Date
- ACS Macro Letters
- VOL 1, NO 11, 1279-1284
- A perpendicular orientation of high-aspect-ratio polystyrene-block-polydimethylsiloxane (PS-b-PDMS) cylindrical
and lamellar PDMS microdomains was achieved by solvent annealing and then slowly drying thick PS-b-PDMS films.
Perpendicularly oriented microdomains occurred throughout the film thickness, except at the air interface, where a layer of inplane
microdomains formed due to the surface energy difference between PS and PDMS. In contrast, thermal annealing
produced in-plane orientation throughout the film thickness. The solvent-annealed perpendicular orientation was observed for
cylindrical morphology PS-b-PDMS of 16 and 45 kg/mol, where PDMS is the minority block, and lamellar PS-b-PDMS of 43 kg/
mol. To obtain fully perpendicular microdomain patterns, a nonselective high-powered 450 W CF4/O2 reactive ion etching
process was performed to remove the top layer of the films. Substrate patterning using electron beam lithography produced local
registration of 17 nm period hexagonal cylinder patterns.
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