High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing

Title
High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing
Authors
손정곤Kevin GotirkCaroline Ross
Issue Date
2012-11
Publisher
ACS Macro Letters
Citation
VOL 1, NO 11, 1279-1284
Abstract
A perpendicular orientation of high-aspect-ratio polystyrene-block-polydimethylsiloxane (PS-b-PDMS) cylindrical and lamellar PDMS microdomains was achieved by solvent annealing and then slowly drying thick PS-b-PDMS films. Perpendicularly oriented microdomains occurred throughout the film thickness, except at the air interface, where a layer of inplane microdomains formed due to the surface energy difference between PS and PDMS. In contrast, thermal annealing produced in-plane orientation throughout the film thickness. The solvent-annealed perpendicular orientation was observed for cylindrical morphology PS-b-PDMS of 16 and 45 kg/mol, where PDMS is the minority block, and lamellar PS-b-PDMS of 43 kg/ mol. To obtain fully perpendicular microdomain patterns, a nonselective high-powered 450 W CF4/O2 reactive ion etching process was performed to remove the top layer of the films. Substrate patterning using electron beam lithography produced local registration of 17 nm period hexagonal cylinder patterns.
URI
http://pubs.kist.re.kr/handle/201004/43440
ISSN
21611653
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KIST Publication > Article
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