Etch stop characteristics of SrBi2Ta2O9 thin film by using CeO2 buffer layer

Title
Etch stop characteristics of SrBi2Ta2O9 thin film by using CeO2 buffer layer
Authors
권영석심선일김성일김영환최인훈
Keywords
ICP-RIE; etch stop; etch rate; selectivity
Issue Date
2004-12
Publisher
Journal of the Korean Physical Society
Citation
VOL 45, NO 96, s708-s711
URI
http://pubs.kist.re.kr/handle/201004/43514
ISSN
0374-4884
Appears in Collections:
KIST Publication > Article
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