High-fidelity conformation of graphene to SiO2 topographic features
- High-fidelity conformation of graphene to SiO2 topographic features
- W. G. Cullen; M. Yamamoto; K. M. Burson; J. H. Chen; 장차운; L. Li; M. S. Fuhrer; E. D. Williams
- Issue Date
- Physical review letters
- VOL 105, NO 21, 215504-1-215504-4
- High-resolution noncontact atomic force microscopy of SiO2 reveals previously unresolved roughness
at the few-nm length scale, and scanning tunneling microscopy of graphene on SiO2 shows graphene to be
slightly smoother than the supporting SiO2 substrate. A quantitative energetic analysis explains the
observed roughness of graphene on SiO2 as extrinsic, and a natural result of highly conformal adhesion.
Graphene conforms to the substrate down to the smallest features with nearly 99% fidelity, indicating
conformal adhesion can be highly effective for strain engineering of graphene.
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