High-fidelity conformation of graphene to SiO2 topographic features

Title
High-fidelity conformation of graphene to SiO2 topographic features
Authors
W. G. CullenM. YamamotoK. M. BursonJ. H. Chen장차운L. LiM. S. FuhrerE. D. Williams
Issue Date
2010-11
Publisher
Physical review letters
Citation
VOL 105, NO 21, 215504-1-215504-4
Abstract
High-resolution noncontact atomic force microscopy of SiO2 reveals previously unresolved roughness at the few-nm length scale, and scanning tunneling microscopy of graphene on SiO2 shows graphene to be slightly smoother than the supporting SiO2 substrate. A quantitative energetic analysis explains the observed roughness of graphene on SiO2 as extrinsic, and a natural result of highly conformal adhesion. Graphene conforms to the substrate down to the smallest features with nearly 99% fidelity, indicating conformal adhesion can be highly effective for strain engineering of graphene.
URI
http://pubs.kist.re.kr/handle/201004/44466
ISSN
00319007
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE