Effect of Substrate Bias and Hydrogen Addition on the Residual Stress of Hexagonal Boron Nitride Film Prepared by Sputtering of B4C Target with Ar/N2 Reactive Gas

Title
Effect of Substrate Bias and Hydrogen Addition on the Residual Stress of Hexagonal Boron Nitride Film Prepared by Sputtering of B4C Target with Ar/N2 Reactive Gas
Authors
박종극이정훈이욱성백영준
Issue Date
2013-05
Publisher
ICMCTF2013
URI
http://pubs.kist.re.kr/handle/201004/44912
Appears in Collections:
KIST Publication > Conference Paper
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