Enhancement of Reconstructed Image by Noise Reduction for Mask Inspection of EUVL (Extreme Ultra-Violet Light) Lithography

Title
Enhancement of Reconstructed Image by Noise Reduction for Mask Inspection of EUVL (Extreme Ultra-Violet Light) Lithography
Authors
조정근조성진박민철전영민Byeong-Kwon JuJung-Young Son
Keywords
Noise; Reduction; Mask; Inspection; EUVL; phase retrieval; dust; noise reduction; image enhancement
Issue Date
2013-07
Publisher
Proceeding of Euro-American Workshop on Information Optics
Citation
, 1-2
Abstract
In mask inspection of extreme ultra-violet lithography, defect sizes and locations are critical factors on semiconductor production. This paper addresses a simulated solution of phase retrieval method to reduce a fine dust suspended in the air or on the CCD surface. To reduce such noise, we introduce an image enhancement method. Experimental result shows the contaminated materials such as fine dust can be reduced by the suggested method.
URI
http://pubs.kist.re.kr/handle/201004/45218
Appears in Collections:
KIST Publication > Conference Paper
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