Electrodeposited porous and amorphous copper oxide film for application in supercapacitor
- Electrodeposited porous and amorphous copper oxide film for application in supercapacitor
- Patake; Joshi; 록핸드; 주오심
- copperoxide; thin films; amorphous; electrochemical properties
- Issue Date
- Materials chemistry and physics
- VOL 114, NO 1, 6-9
- In present study, the porous amorphous copper oxide thin films have been deposited from alkaline sulphate bath. The cathodic electrodeposition method was employed to deposit copper oxide film at room temperature onstainless steel substrate. Their structural and surface morphological propertieswere investigated by means of X-ray diffraction (XRD) and scanning electron micrograph (SEM), respectively. To propose this as a new material for possible application in the supercapacitor, its electrochemical properties have been studied in aqueous 1MNa2SO4 electrolyte using cyclic voltammetry. The structural analysis fromXRDpattern showedthe formation ofamorphouscopper oxidefilmonthe substrate. The surfacemorphological studies from scanning electron micrographs revealed the formation of porous cauliflower-like copper oxide film. The cyclic voltammetric curves showed symmetric nature and increase in capacitance with increase in film thickness. The maximum specific capacitance of 36 F g−1 was exhibited for the 0.6959mgcm−2 film thickness. This shows that low-cost copper oxide electrode will be a potential application in supercapacitor.
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