Fabrication of ultra-high-density nanodot array patterns (~3 Tbits/in.2) using electron-beam lithography

Title
Fabrication of ultra-high-density nanodot array patterns (~3 Tbits/in.2) using electron-beam lithography
Authors
이민현김현미조성용임기필박수연이재종김기범
Keywords
nanoimprint; high resolution; e-beam lithography
Issue Date
2011-10
Publisher
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena : an official journal of the American Vacuum Society
Citation
VOL 29, NO 6, 061602-1-061602-5
Abstract
The authors fabricated 15 nm pitch scale high-density dot patterns on a Si substrate using a hydrogen silsesquioxane electron-beam (e-beam) resist, vacuum treatment as a prebake, and vertical sidewall etching. The e-beam lithography was performed at 100 keV. The dot density fabricated was close to 3 Tbits/in.,2 which is one of the highest density patterns reported thus far. The process window was quite wide and the result can be easily and routinely duplicated.
URI
http://pubs.kist.re.kr/handle/201004/45704
ISSN
10711023
Appears in Collections:
KIST Publication > Article
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