Fabrication of Nano-Sized Magnetic Tunnel Junctions Using Lift-Off Process Assisted by Atomic Force Probe Tip
- Fabrication of Nano-Sized Magnetic Tunnel Junctions Using Lift-Off Process Assisted by Atomic Force Probe Tip
- 정구열; 민병철; 안치의; 최경민; 신일재; 박승영; 이긍원; 신경호
- Magnetic Tunnel Junction; Spin Transfer Torque; E-Beam Lithography; Lift-Off
- Issue Date
- Journal of nanoscience and nanotechnology
- VOL 13, NO 9, 6467-6470
- We present a fabrication method for nano-scale magnetic tunnel junctions (MTJs), employing
e-beam lithography and lift-off process assisted by the probe tip of atomic force microscope (AFM).
It is challenging to fabricate nano-sized MTJs on small substrates because it is difficult to use
chemical mechanical planarization (CMP) process. The AFM-assisted lift-off process enables us
to fabricate nano-sized MTJs on small substrates (12.5 mm×12.5 mm) without CMP process.
The e-beam patterning has been done using bi-layer resist, the poly methyl methacrylate (PMMA)/
hydrogen silsesquioxane (HSQ). The PMMA/HSQ resist patterns are used for both the etch mask
for ion milling and the self-aligned mask for top contact formation after passivation. The self-aligned
mask buried inside a passivation oxide layer, is readily lifted-off by the force exerted by the probe
tip. The nano-MTJs (160 nm×90 nm) fabricated by this method show clear current-induced magnetization
switching with a reasonable TMR and critical switching current density.
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