Fabrication of Nano-Sized Magnetic Tunnel Junctions Using Lift-Off Process Assisted by Atomic Force Probe Tip

Title
Fabrication of Nano-Sized Magnetic Tunnel Junctions Using Lift-Off Process Assisted by Atomic Force Probe Tip
Authors
정구열민병철안치의최경민신일재박승영이긍원신경호
Keywords
Magnetic Tunnel Junction; Spin Transfer Torque; E-Beam Lithography; Lift-Off Process
Issue Date
2013-09
Publisher
Journal of nanoscience and nanotechnology
Citation
VOL 13, NO 9, 6467-6470
Abstract
We present a fabrication method for nano-scale magnetic tunnel junctions (MTJs), employing e-beam lithography and lift-off process assisted by the probe tip of atomic force microscope (AFM). It is challenging to fabricate nano-sized MTJs on small substrates because it is difficult to use chemical mechanical planarization (CMP) process. The AFM-assisted lift-off process enables us to fabricate nano-sized MTJs on small substrates (12.5 mm×12.5 mm) without CMP process. The e-beam patterning has been done using bi-layer resist, the poly methyl methacrylate (PMMA)/ hydrogen silsesquioxane (HSQ). The PMMA/HSQ resist patterns are used for both the etch mask for ion milling and the self-aligned mask for top contact formation after passivation. The self-aligned mask buried inside a passivation oxide layer, is readily lifted-off by the force exerted by the probe tip. The nano-MTJs (160 nm×90 nm) fabricated by this method show clear current-induced magnetization switching with a reasonable TMR and critical switching current density.
URI
http://pubs.kist.re.kr/handle/201004/45797
ISSN
15334880
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KIST Publication > Article
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