Fabrication of Smooth Patterned Structures of Refractory Metals, Semiconductors, and Oxides via Template Stripping
- Fabrication of Smooth Patterned Structures of Refractory Metals, Semiconductors, and Oxides via Template Stripping
- 박종혁; Prashant Nagpal; Kevin M. McPeak; Nathan C. Lindquist; Sang-Hyun Oh; David J. Norris
- template stripping; refractory metals; oxides; photovoltaics; themophotovoltaics
- Issue Date
- ACS Applied Materials & Interfaces
- VOL 5, NO 19, 9701-9708
- The template-stripping method can yield smooth patterned
films without surface contamination. However, the process is typically limited
to coinage metals such as silver and gold because other materials cannot be
readily stripped from silicon templates due to strong adhesion. Herein, we
report a more general template-stripping method that is applicable to a larger
variety of materials, including refractory metals, semiconductors, and oxides.
To address the adhesion issue, we introduce a thin gold layer between the
template and the deposited materials. After peeling off the combined film from
the template, the gold layer can be selectively removed via wet etching to reveal
a smooth patterned structure of the desired material. Further, we demonstrate
template-stripped multilayer structures that have potential applications for
photovoltaics and solar absorbers. An entire patterned device, which can
include a transparent conductor, semiconductor absorber, and back contact,
can be fabricated. Since our approach can also produce many copies of the patterned structure with high fidelity by reusing the template, a low-cost and high-throughput process in micro- and nanofabrication is provided that is useful for electronics, plasmonics, and nanophotonics.
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