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dc.contributor.author조현진-
dc.contributor.author박성찬-
dc.contributor.author이창협-
dc.contributor.author강정호-
dc.contributor.author박진형-
dc.contributor.author강상욱-
dc.contributor.author김명종-
dc.date.accessioned2015-12-03T01:06:41Z-
dc.date.available2015-12-03T01:06:41Z-
dc.date.issued201307-
dc.identifier.other41156-
dc.identifier.urihttp://pubs.kist.re.kr/handle/201004/46786-
dc.description.abstractIn order to synthesize high quality and large area hexagonal boron nitride nanosheets (h-BNNS, white graphene), pure borazine (B3N3H6) was used as a molecular precursor, and argon (Ar) was added in order to greatly facilitate the effect of plasma (ICP). Electrochemical polished metal foils were used as catalysts and the catalytic effect of various metals has been studied. The plasma (ICP) could supply high enough energy to dissociate gases forming ionized species of borazine in a quartz tube furnace of CVD setup. In this study, one or few layers of h-BNNS were synthesized at mild temperatures under plasma enhanced chemical vapor deposition (PECVD) at the optimal ratio between borazine and argon. The analyses of h-BNNS were carried out using SEM, Raman, FT-IR, XPS, TEM, EELS and SAED. As an application, the gas barrier effect of has been demonstrated.-
dc.publisherNano Korea 2013-
dc.subjecthexagonal boron nitride-
dc.subjectwhite graphene-
dc.subjectplasma-
dc.subjectchemical vapor deposition-
dc.titleLow Temperature Synthesis of Hexagonal Boron Nitride (White Graphene) by Remote Plasma Enhanced Chemical Vapor Deposition-
dc.typeConference Paper-
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