Vacuum-Induced Wrinkle Arrays of InGaAs Semiconductor Nanomembranes on Polydimethylsiloxane Microwell Arrays

Title
Vacuum-Induced Wrinkle Arrays of InGaAs Semiconductor Nanomembranes on Polydimethylsiloxane Microwell Arrays
Authors
엄두승임성동이용수이호찬김형준Wen-Chun YenYu-Lun Chueh고현협
Keywords
III-V semiconductor; InGaAs nanomembrane; vacuum-induced wrinkle; PDMS microwell; transfer printing
Issue Date
2014-03
Publisher
ACS Nano
Citation
VOL 8, NO 3, 3080-3087
Abstract
Tunable surface morphology in III–V semiconductor nanomembranes provides opportunities to modulate electronic structures and light interactions of semiconductors. Here, we introduce a vacuum-induced wrinkling method for the formation of ordered wrinkles in InGaAs nanomembranes (thickness, 42 nm) on PDMS microwell arrays as a strategy for deterministic and multidirectional wrinkle engineering of semiconductor nanomembranes. In this approach, a vacuum-induced pressure difference between the outer and inner sides of the microwell patterns covered with nanomembranes leads to bulging of the nanomembranes at the predefined microwells, which, in turn, results in stretch-induced wrinkle formation of the nanomembranes between the microwells. The direction and geometry of the nanomembrane wrinkles are well controlled by varying the PDMS modulus, depth, and shape of microwells, and the temperature during the transfer printing of nanomembrane onto heterogeneous substrates. The wrinkling method shown here can be applied to other semiconductor nanomembranes and may create an important platform to realize unconventional electronic devices with tunable electronic properties.
URI
http://pubs.kist.re.kr/handle/201004/47387
ISSN
19360851
Appears in Collections:
KIST Publication > Article
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