Transforming One-Dimensional Nanowalls to Long-Range Ordered Two-Dimensional Nanowaves: Exploiting Buckling Instability and Nanofibers Effect in Holographic Lithography

Title
Transforming One-Dimensional Nanowalls to Long-Range Ordered Two-Dimensional Nanowaves: Exploiting Buckling Instability and Nanofibers Effect in Holographic Lithography
Authors
Jie Li조이길최인석Shu Yang
Keywords
holographic lithography; buckling; nanowaves; long-range order; nanofibers
Issue Date
2014-04
Publisher
Advanced functional materials
Citation
VOL 24, NO 16, 2361-2366
Abstract
Two-dimensional nanowaves with long-range order are fabricated by exploiting swelling-induced buckling of one-dimensional (1D) nanowalls with nanofibers formed in-between during holographic lithography of the negative-tone photoresist SU-8. The 1D film goes through a constrained swelling in the development stage, and becomes buckled above the critical threshold. The degree of lateral undulation can be controlled by tuning the pattern aspect ratio (height/width) and exposure dosage. At a high aspect ratio (e.g., 6) and a high exposure dosage, nanofibers (30–50 nm in diameter) are formed between the nanowalls as a result of overlapping of low crosslinking density regions. By comparing experimental results with finite-element analysis, the buckling mechanism is investigated, which confirms that the nanofibers prevent the deformed nanowalls from recovery to their original state, thus, leading to long-range ordered two-dimensional (2D) wavy structures. The film with nanowaves show weaker reflecting color under an ambient light and lower transmittance compared to the straight nanowalls. Using double exposure through a photomask, patterns consisting of both nanowaves and nanowalls for optical display are created.
URI
http://pubs.kist.re.kr/handle/201004/48323
ISSN
1616301X
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KIST Publication > Article
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