Atomistic Modeling for Interfacial Properties of Ni-Al-V Ternary System
- Atomistic Modeling for Interfacial Properties of Ni-Al-V Ternary System
- Wei-ping Dong; Byeong-Joo Lee; Chen Zheng
- alloys; solutionization; segregation; computer simulation; interfacial properties
- Issue Date
- Metals and Materials International
- VOL 20, NO 3, 423-429
- Interatomic potentials for Ni-Al-V ternary systems have been developed based on the second-nearest-neighbor modified embedded-atom method potential formalism. The potentials can describe various fundamental physical properties of the relevant materials in good agreement with experimental information. The potential is utilized for an atomistic computation of interfacial properties of Ni-Al-V alloys. It is found that vanadium atoms segregate on the γ-fcc/L12 interface and this segregation affects the interfacial properties. The applicability of the atomistic approach to an elaborate alloy design of advanced Ni-based superalloys through the investigation of the effect of alloying elements on interfacial properties is discussed.
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