Selectivities of an All-wet-processed Electrode Film on ITO, ZnO, SiNx and Doped Si for Solar Cell Applications

Title
Selectivities of an All-wet-processed Electrode Film on ITO, ZnO, SiNx and Doped Si for Solar Cell Applications
Authors
김아름최희수이선재최은미구인화이욱재Soo-Kil Kim윤성훈손형빈표성규윤성필
Keywords
SiNx; ZnO; ITO; doped Si; Electroless plating
Issue Date
2014-07
Publisher
Journal of the Korean Physical Society
Citation
VOL 65, NO 2, 222-228
Abstract
We investigated the role of Ni/Cu metallization and the characteristics of selective thin-film deposition on the Indium tin oxide (ITO), ZnO, SiNx and doped Si surfaces of a silicon solarcell electrode. We propose Ni/Cu metallization as an alternative to silver screen-printing. Our method, called the selective electrode formation (SEF) process, utilizes a low-cost, streamlined wet chemical process. Metallization was confirmed to occur on the Si electrode with adhesion through Pd activation. Ni, which hinders Cu diffusion, was then selectively deposited from a NaH2PO2 based nickel solution, and Cu, the main electrode material, was deposited from a HCHObased copper solution. Ni/Cu was deposited on the ZnO, ITO, or SiNx film. The deposition and the heat treatment of Ni and Cu were successfully performed on a substrate consisting of a patterned n+-doped wafer with POCl3 by maintaining the same steady process conditions as in process.
URI
http://pubs.kist.re.kr/handle/201004/48582
ISSN
03744884
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE