Influence of Electrochemical Polishing and High-Pressure Annealing on Physical Properties of Chemical Vapor Deposition Graphene
- Influence of Electrochemical Polishing and High-Pressure Annealing on Physical Properties of Chemical Vapor Deposition Graphene
- 펠리시타; 조현진; 김명종
- CVD; graphene; physical properties
- Issue Date
- Electrochemical polishing (ECP) pre-treatment and atmospheric pressure annealing were performed on copper foil in order to obtain large graphene domain size in CVD growth method, which later on confirmed by SEM, optical microscopy, and Raman spectroscopy. The larger domain size was expected to improve the quality of graphene, but on the contrary, the sheet resistance of the samples shows that it increases with the larger domain size. We concluded that even though the domain size is larger, the sheet resistance of graphene is more affected by the defect density on the graphene itself.
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