Influence of Electrochemical Polishing and High-Pressure Annealing on Physical Properties of Chemical Vapor Deposition Graphene

Title
Influence of Electrochemical Polishing and High-Pressure Annealing on Physical Properties of Chemical Vapor Deposition Graphene
Authors
펠리시타조현진김명종
Keywords
CVD; graphene; physical properties
Issue Date
2014-11
Publisher
한국탄소학회
Abstract
Electrochemical polishing (ECP) pre-treatment and atmospheric pressure annealing were performed on copper foil in order to obtain large graphene domain size in CVD growth method, which later on confirmed by SEM, optical microscopy, and Raman spectroscopy. The larger domain size was expected to improve the quality of graphene, but on the contrary, the sheet resistance of the samples shows that it increases with the larger domain size. We concluded that even though the domain size is larger, the sheet resistance of graphene is more affected by the defect density on the graphene itself.
URI
http://pubs.kist.re.kr/handle/201004/48782
Appears in Collections:
KIST Publication > Conference Paper
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