A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub-10 nm Microdomains in Si-Containing Block Copolymer Thin Films

Title
A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub-10 nm Microdomains in Si-Containing Block Copolymer Thin Films
Authors
김은진김원정이광희Caroline A. Ross손정곤
Keywords
block copolymer; sub-10 nm patterning; perpendicular orientation; self-assembly; solvent annealing; top coats
Issue Date
2014-11
Publisher
Advanced functional materials
Citation
VOL 24, NO 44, 6981-6988
Abstract
Achieving sub-10 nm high-aspect-ratio patterns from diblock copolymer self-assembly requires both a high interaction parameter (χ, which is determined by the incompatibility between the two blocks) and a perpendicular orientation of microdomains. However, these two conditions are extremely difficult to achieve simultaneously because the blocks in a high-χ copolymer typically have very different surface energies, favoring in-plane microdomain orientations. A fully perpendicular orientation of a high-χ block copolymer, poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) is realized here using partially hydrolyzed polyvinyl alcohol (PVA) top coats with a solvent annealing process, despite the large surface energy differences between PS and PDMS. The PVA top coat on the block copolymer films under a solvent vapor atmosphere significantly reduces the interfacial energy difference between two blocks at the top surface and provides sufficient solvent concentration gradient in the through-thickness direction and appropriate solvent evaporation rates within the film to promote a perpendicular microdomain orientation. The effects of interfacial energy differences and the swellability of PVA top coats controlled by the degree of hydrolysis on the orientation of micro­domains are examined. The thickness of the BCP film and top coats also affects the orientation of the BCP film.
URI
http://pubs.kist.re.kr/handle/201004/48804
ISSN
1616301X
Appears in Collections:
KIST Publication > Article
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