Development of Coherent Scattering Microscopy Mask Inspection System using a Coherent EUV Light Source

Title
Development of Coherent Scattering Microscopy Mask Inspection System using a Coherent EUV Light Source
Authors
전영민김용수안준모이주한성하민김점술이승범조현우박민철조운조김용태
Keywords
Coherent Scattering Microscopy; Mask Inspection; EUV
Issue Date
2014-04
Publisher
차세대 리소그래피 학술대회
Citation
, 148-149
URI
http://pubs.kist.re.kr/handle/201004/49046
Appears in Collections:
KIST Publication > Conference Paper
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