Microstructure and Properties of Silicon-Incorporated DLC Film Fabricated Using HMDS Gas and RF-PECVD Process

Title
Microstructure and Properties of Silicon-Incorporated DLC Film Fabricated Using HMDS Gas and RF-PECVD Process
Authors
송병주송우진한준현김가람윤수종김태규김진권조현김긍호황대원김혜성
Keywords
Hexamethyldisilane; Radio-Frequency; Plasma-Enhanced; Chemical Vapor Deposition; Multilayered Silicon-Doped; Diamond-Like Carbon; Magnesium Alloy Substrate
Issue Date
2014-12
Publisher
Journal of nanoscience and nanotechnology
Citation
VOL 14, NO 12, 9124-9130
Abstract
The microstructure and characteristics of silicon-incorporated diamond-like carbon film, fabricated using a radio-frequency plasma-enhanced chemical vapor deposition process with hexamethyldisilane [(CH3 3Si · Si(CH3 3:HMDS] gas as a silicon source, were investigated. Diamond-like carbon films with silicon compositions from 0 to 5 atomic percent were deposited onto ultra-fine grained AZ31 magnesium alloy substrate as buffer layers or multilayers. Si doping led not only to an increase in the bonding ratio (sp3/sp2), but improvements in hardness, critical adhesion, and corrosion resistance. Out of the investigated samples, the multi-deposited silicon diamond-like carbon thin film on magnesium substrate showed the best combination of adhesive, wear resistance, and corrosion resistance properties.
URI
http://pubs.kist.re.kr/handle/201004/49127
ISSN
15334880
Appears in Collections:
KIST Publication > Article
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