Topcoat-Assisted Perpendicular and Straightly Parallel Coexisting Orientations of Block Copolymer Films
- Topcoat-Assisted Perpendicular and Straightly Parallel Coexisting Orientations of Block Copolymer Films
- 정지영; 하정숙; 이상수; 손정곤
- block copolymer; self-assembly; top coat; orientation
- Issue Date
- Macromolecular rapid communications
- VOL 36, NO 13, 1261-1266
- Highly ordered perpendicular orientation and straightly parallel orientation coexisting
polystyrene- block -polydimethylsiloxane (PS- b -PDMS) cylindrical microdomains with 10 nm
width can be realized by using polyvinyl acetate as a partially dewetted topcoat and solvent
annealing with acetone vapor. During solvent annealing, the swelled topcoat begins to dewet
and the dewetting rim sweeps the surface of the block copolymer fi lms to align the cylindrical microdomains with the direction of dewetting propagation. However, the wetted region of the topcoat/PS- b -PDMS fi lm forms with a perpendicular orientation due to reduced surface tension and suffi cient concentration gradient in the solvent evaporation step. The orientational changes (perpendicular/straightly parallel orientation) in the dewetted/wetted area are also investigated according to the vapor pressure of solvent annealing. The degree of directionality of the swept PS- b -PDMS fi lms according to the distance from the dewetting front, which is equivalent with time after sweeping, is examined. To control the direction of dewetting and complex structures within a specifi c area, an imprinting process is introduced to form topographical line–space patterns in the topcoat and perpendicular/parallel orientation of BCP patterns in the line–space patterns, respectively.
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