Actinic EUV Mask Inspection using Coherent EUV Source based on High-order Harmonic Generation

Title
Actinic EUV Mask Inspection using Coherent EUV Source based on High-order Harmonic Generation
Authors
김용수박준박한용성하민김점술이승범조현우이주한박민철전영민
Keywords
CSM; HHG; EUV; EUV Mask Inspection; Coherence
Issue Date
2015-08
Publisher
Conference on Laser and Electro-Optics Pacific Rim(CLEO-PR)
Citation
VOL 26F2-4, 1-2
Abstract
We developed a coherent scattering microscope (CSM) for actinic EUV mask inspection. The CSM system was designed to measure critical dimensions down to 88 nm, and 200 nm l/s patterns were experimentally inspected.
URI
http://pubs.kist.re.kr/handle/201004/50205
Appears in Collections:
KIST Publication > Conference Paper
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