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dc.contributor.author이진주-
dc.contributor.author하종윤-
dc.contributor.author임해나-
dc.contributor.author최원국-
dc.contributor.author최지원-
dc.date.accessioned2015-12-03T02:07:27Z-
dc.date.available2015-12-03T02:07:27Z-
dc.date.issued201510-
dc.identifier.citationVOL 15, 8370-8374-
dc.identifier.issn15334880-
dc.identifier.other45203-
dc.identifier.urihttp://pubs.kist.re.kr/handle/201004/50619-
dc.description.abstractThe large-area Al-doped ZnO thin films are successfully deposited at room temperature on polycarbonate substrate using a 1500 mm dual cylindrical cathodes sputtering system. Those thin films have smooth surfaces (RMS: 9.6 nm) and lower thicknesses deviation (Uniformity: 98.6%) despite of high RF power. The optical transmittance properties of 3.13 wt% Al doped ZnO thin films have above 85% in visible region. A dual cylindrical cathodes sputtering system can fabricate transparent electrode on flexible electronic devices at room temperature for mass production of 6th generation solar cell and display industry-
dc.publisherJournal of nanoscience and nanotechnology-
dc.subjectMesoporous Tin Oxide-
dc.subjectHazardous Gas Sensor-
dc.subjectImpregnated Palladium-
dc.subjectTransparent Conducting Oxide-
dc.subjectAl-Doped ZnO-
dc.subjectCylindrical Type Magnetron Cathode Source-
dc.titleCrystal Structure and Optical Properties of Al-Doped ZnO Large-Area Thin Films Using 1500 mm Dual Cylindrical Cathodes-
dc.typeArticle-
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