Nanostructures formed on carbon-based materials with different levels of crystallinity using oxygen plasma treatment

Title
Nanostructures formed on carbon-based materials with different levels of crystallinity using oxygen plasma treatment
Authors
고태준조원진이헌주오규환문명운
Keywords
carbon based materials; plasma etching; selective etching; crystallinity
Issue Date
2015-09
Publisher
Thin solid films
Citation
VOL 590, 324-329
Abstract
Nanostructure formation was explored for various carbon-based materials, such as diamond, carbon fiber, polyethylene terephthalate and poly (methylmethacrylate), which have different levels of crystallinity, ranging from perfect crystal to polymeric amorphous. After treatment of oxygen plasma glow discharge, the nanostructures on these carbon-based materials were found to evolve via preferential etching due to the co-deposition of metal elements sputtered from the metal cathode plate. Local islands or clusters formed by the metal co-deposition have a low etching rate compared to pristine regions on each material, resulting in anisotropic patterns on the carbon-based materials. This pattern formation mechanism was confirmed by covering the cathode or preventing the co-deposition of metallic sources with a polymeric material. Regardless of the level of crystallinity of the carbon-based materials, no patterns were observed on the surfaces covered with the polymeric material, and the surfaces were uniformly etched. It was found that the materials with low crystallinity had a high etching rate due to low carbon atom density, which thus easily formed high-aspect-ratio nanostructures for the same plasma treatment duration. (C) 2015 Elsevier B.V. All rights reserved.
URI
http://pubs.kist.re.kr/handle/201004/50739
ISSN
00406090
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE