Effect of chemical mechanical treatment on the optoelectronic properties in CMOS image sensor

Title
Effect of chemical mechanical treatment on the optoelectronic properties in CMOS image sensor
Authors
Eunmi ChoiAreum KimSoon Hyeong KwonYinhua CuiSeon Jea LeeUkjae LeeHee Soo ChoiSang June Hahn윤성필Hyung Bin SonSung Gyu Pyo
Keywords
CMOS Image Sensor; CMP; Focal Length; White Sensitivity; Dead Zone
Issue Date
2015-02
Publisher
The Korean journal of chemical engineering
Citation
VOL 32, NO 2, 199-201
Abstract
This paper presents the effect focal length variation by controlling chemical mechanical polishing (CMP) processes on the CIS optical performance. White sensitivity was drastically increased, and saturation signal variation and dead zone deviation were reduced. These experimental results showed that controlled focal length was able to increase CIS optoelectronic performance.
URI
http://pubs.kist.re.kr/handle/201004/50779
ISSN
02561115
Appears in Collections:
KIST Publication > Article
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