CMOS Image Sensor; CMP; Focal Length; White Sensitivity; Dead Zone
The Korean journal of chemical engineering
VOL 32, NO 2, 199-201
This paper presents the effect focal length variation by controlling chemical mechanical polishing (CMP) processes on the CIS optical performance. White sensitivity was drastically increased, and saturation signal variation and dead zone deviation were reduced. These experimental results showed that controlled focal length was able to increase CIS optoelectronic performance.