Full metadata record

DC FieldValueLanguage
dc.contributor.author알버트 이성수-
dc.contributor.authorOh, Sung Yeoun-
dc.contributor.authorChoi, Seung-Sock-
dc.contributor.authorLee, He Seung-
dc.contributor.author황승상-
dc.contributor.author백경열-
dc.date.accessioned2015-12-03T02:09:12Z-
dc.date.available2015-12-03T02:09:12Z-
dc.date.issued201507-
dc.identifier.citationVOL 5, NO 82, 66511-66517-
dc.identifier.issn20462069-
dc.identifier.other45598-
dc.identifier.urihttp://pubs.kist.re.kr/handle/201004/51015-
dc.description.abstractA series of organic-inorganic hybrid spin-on-glass polymethylsilsesquioxanes were synthesized utilizing a cyclic siloxane precursor, 1,3,5,7-tetramethyl-1,3,5,7-tetrahydroxyl cyclosiloxane (MT4-OH), copolymerized with methyltriethoxysilane (MTES) at various comonomer ratios. By selectively introducing this 2-D cyclic crosslinker, we were able to obtain spin-on-glass hybrimers with low dielectric constant (2.5-2.7), high nanoindentation modulus (5-10.5 GPa), with high thermal stability (> 700 degrees C) without the use of porogens or additives. The use of the cyclic monomer MT4-OH greatly increased the mechanical properties, which allowed for impeccable reliability of a variety of patterns obtained through etching and chemical mechanical planarization processes, while maintaining optimal gap-filling properties. Due to the superior dielectric, mechanical, and integrated processing of these materials, these hybrids derived from MT4-OH may be utilized as next generation spin-on-glass low-dielectric constant materials.-
dc.publisherRSC advances-
dc.titleRobust spin-on-glass poly(methyl)silsesquioxane-based low-k materials derived from a cyclic siloxane precursor-
dc.typeArticle-
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE