Effect of Processing Parameters on the Formation of Large Area Self-Assembled Monolayer of Polystyrene Beads by a Convective Self-Assembly Method

Title
Effect of Processing Parameters on the Formation of Large Area Self-Assembled Monolayer of Polystyrene Beads by a Convective Self-Assembly Method
Authors
서안나최지환변재철김원목김인호이경석
Keywords
Convective self-assembly; Restricted meniscus convective self-assembly; Large area polystyrene beads monolayer formation
Issue Date
2015-12
Publisher
한국재료학회지; Korean Journal of Materials Research
Citation
VOL 25, NO 12, 647-654
Abstract
Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a highthroughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.
URI
http://pubs.kist.re.kr/handle/201004/58336
ISSN
12250562
Appears in Collections:
KIST Publication > Article
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