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dc.contributor.authorN. Choudhary-
dc.contributor.authorM. Patel-
dc.contributor.authorY.H. Ho-
dc.contributor.authorN.B. Dahotre-
dc.contributor.author이원기-
dc.contributor.author황준연-
dc.contributor.authorW. Choi-
dc.date.accessioned2016-01-12T17:00:02Z-
dc.date.available2016-01-12T17:00:02Z-
dc.date.issued201512-
dc.identifier.citationVOL 3, NO 47, 24049-24054-
dc.identifier.issn20507488-
dc.identifier.other46058-
dc.identifier.urihttp://pubs.kist.re.kr/handle/201004/58417-
dc.description.abstractTwo dimensional (2D) layered materials have recently attracted significant research interest owing to their unique physical and chemical properties for efficient electrochemical energy storage devices. Here, we present a neoteric approach to fabricate high performance MoS2 thin film supercapacitor electrodes by using a direct magnetron sputtering technique. The novel three-dimensional (3D) porous structure of the MoS2 film exhibits an excellent capacitance of similar to 330 F cm(-3) along with a high volumetric power and energy density of 40-80 W cm(-3) and 1.6-2.4 mW h cm(-3), respectively. Moreover, the optimized MoS2 electrode shows an outstanding cyclic stability, yielding capacitance retention over 97% after 5000 cycles of charging/discharging. The contemporary approach to MoS2 supercapacitor electrode fabrication will enable new opportunities in flexible electronic and energy devices.-
dc.publisherJournal of materials chemistry. A, Materials for energy and sustainability-
dc.subjectMoS2-
dc.subjectSupercapacitor-
dc.subjectTEM-
dc.subjectthin film-
dc.titleDirectly deposited MoS2 thin film electrodes for high performance supercapacitors-
dc.typeArticle-
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