Chameleonic electrochemical metallization cells: dual-layer solid electrolyte-inducing various switching behaviours
- Chameleonic electrochemical metallization cells: dual-layer solid electrolyte-inducing various switching behaviours
- 박종극; 김인호; 정두석; 임형광; 블라디미르; 김구현; 김도헌; Rohit Soni; Cheol Seong Hwang
- Issue Date
- VOL 8, NO 34, 15621-15628
- We present ‘unusual’ resistive switching behaviours in electrochemical metallization (ECM) cells utilizing a dual-layer (SiOx/GeSex: SiOx on GeSex) solid electrolyte (SE). The observed switching behaviour markedly varies with the thickness of the upper SiOx layer and compliance current: (i) monostable switching, (ii) counter-eightwise bipolar switching, and (iii) combination of monostable and eightwise bipolar switching behaviours. Focusing on cases (i) and (iii), electrical and chemical analyses on these chameleonic cells were performed in an attempt to gain clues to the understanding of the observed complexity. The chemical analysis indicated the upper SiOx layer as a chemical potential well for Cu ions— Cu ions were largely confined in the well. This non-uniform distribution of Cu across the SE perhaps hints at the mechanism for the complex behaviour; it may be a ‘zero-sum game’ between SiOx and GeSex layers, in which the two layers fight over the limited number of Cu atoms/ions.
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