Wear Characteristics of Fluorocarbon Thin Films Deposited Using Inductively Coupled and Capacitively Coupled Plasma Methods

Title
Wear Characteristics of Fluorocarbon Thin Films Deposited Using Inductively Coupled and Capacitively Coupled Plasma Methods
Authors
한승희이연희조윤정장윤정
Keywords
CCP; Fluorocarbon; ICP; LFM; TOF-SIMS; Wear Properties
Issue Date
2016-11
Publisher
Journal of nanoscience and nanotechnology
Citation
VOL 16, NO 11-11485
Abstract
Fluorocarbon thin films were fabricated using two different plasma polymerization techniques with the aim of improving the surface properties of various materials. The plasma-polymerized fluorocarbon thin films were produced using inductively coupled plasma (ICP) and capacitively coupled plasma (CCP) techniques with C2F6 and C3F8 precursors and different processing times. The surfaces of the resulting polymer films were investigated using water contact angle measurements, atomic force microscopy (AFM), and time-of-flight secondary ion mass spectrometry (TOF-SIMS) to obtain information on the hydrophobic properties, surface morphology, and chemical composition of the materials. The fluorocarbon thin films produced by the ICP technique showed greater hydrophobicity and more fluorinated functional groups than did those produced by the CCP technique. The wear of the fluorocarbon thin films was characterized using a ball-on-disk tribometer as well as lateral force microscopy (LFM). The wear test and microscopy results showed that the fluorocarbon thin films deposited using CCP exhibited lower friction coefficients and lower friction forces than those of the films deposited using ICP, indicating that the CCP technique produces fluorocarbon thin films with better microscale and nanoscale wear properties.
URI
http://pubs.kist.re.kr/handle/201004/65103
ISSN
1533-4880
Appears in Collections:
KIST Publication > Article
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