Local etch control for fabricating nanomechanical devices

Title
Local etch control for fabricating nanomechanical devices
Authors
김철기김현석Minrui YuRobert H. Blick
Keywords
etch; nanomechanical devices; fabrication
Issue Date
2010-10
Publisher
Journal of applied physics
Citation
VOL 108-074307-3
Abstract
We report on the fabrication of suspended nanoelectromechanical systems using an etch enhancement technique. Nanoscale beams are defined by conventional electron beam lithography, followed by locally enhanced etching via electron beam exposure. The structures are successfully suspended within the "etch-booster window" by using an HF vapor etch step. The method is simple, does not require a special setup, and allows the spatial and temporal fine-tuning of the underetching process.
URI
http://pubs.kist.re.kr/handle/201004/66047
ISSN
0021-8979
Appears in Collections:
KIST Publication > Article
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