Electron beam induced epitaxial crystallization in a conducting and insulating a-LaAlO3/SrTiO3 system
- Electron beam induced epitaxial crystallization in a conducting and insulating a-LaAlO3/SrTiO3 system
- 장혜정; 백승협; 이광엽; 김진연; 문선영; 김도향; 장호원
- Issue Date
- RSC advances
- VOL 7, NO 64-40285
- Interfacial conductivity at the interface between two insulating oxides, that is 2DEG, shows a number of intriguing properties and applications, such as on/off switching with external electric fields, use in nanoscale electronic devices and tunable conductivity. Here, we report the effect of the interfacial conductivity on the kinetic behavior of electron-beam-induced epitaxial crystallization of an oxide amorphous thin film on an SrTiO3 substrate. Epitaxial growth from the interface can occur without direct e-beam irradiation at the interface due to accumulated charge around the beam position in the insulating materials. 2DEG, which acts as a current path delays the crystallization kinetics, thus delicate control of the crystallized pattern shape and size is available. As a result, successful pattern writing with a width of about 5 nm was performed. The present work provides useful guidelines for coherent atomic scale e-beam patterning considering the critical distance of the electron beam from the interface for the epitaxial growth, e-beam dose rate effect on the growth rate and the heterostructure interfacial conductivity.
- Appears in Collections:
- KIST Publication > Article
- Files in This Item:
There are no files associated with this item.
- RIS (EndNote)
- XLS (Excel)
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.