Surface smoothing of poly(methyl methacrylate) film by laser induced photochemical etching
- Surface smoothing of poly(methyl methacrylate) film by laser induced photochemical etching
- 김영환; 한일기; 박준서; 강준현; 이송이
- surface smoothing; photochemical etching; PMMA; dressed photon
- Issue Date
- Japanese Journal of Applied Physics, Part 1- Regular Papers
- VOL 56-090306-3
- The surface of poly(methyl methacrylate) (PMMA) film was etched by laser irradiation under O2 and vacuum conditions. By activating the O2 molecules near the rough surface, oxygen radicals will preferably etch the protrusions on the PMMA surface. Three lasers of different wavelengths were used for comparison. Laser irradiation at a short wavelength such as 325nm resulted in high etch rates whereas a long wavelength such as 532nm resulted in no effect on the surface profile. The PMMA surface was not etched under the vacuum condition, indicating the necessity of O2 molecules in etching.
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