Surface smoothing of poly(methyl methacrylate) film by laser induced photochemical etching

Title
Surface smoothing of poly(methyl methacrylate) film by laser induced photochemical etching
Authors
김영환한일기박준서강준현이송이
Keywords
surface smoothing; photochemical etching; PMMA; dressed photon
Issue Date
2017-08
Publisher
Japanese Journal of Applied Physics, Part 1- Regular Papers
Citation
VOL 56-090306-3
Abstract
The surface of poly(methyl methacrylate) (PMMA) film was etched by laser irradiation under O2 and vacuum conditions. By activating the O2 molecules near the rough surface, oxygen radicals will preferably etch the protrusions on the PMMA surface. Three lasers of different wavelengths were used for comparison. Laser irradiation at a short wavelength such as 325nm resulted in high etch rates whereas a long wavelength such as 532nm resulted in no effect on the surface profile. The PMMA surface was not etched under the vacuum condition, indicating the necessity of O2 molecules in etching.
URI
http://pubs.kist.re.kr/handle/201004/66098
ISSN
0021-4922
Appears in Collections:
KIST Publication > Article
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