Fabrication of transparent NiTe2 electrodes via magnetron sputtering combined with chemical exfoliation

Title
Fabrication of transparent NiTe2 electrodes via magnetron sputtering combined with chemical exfoliation
Authors
김승민Sung Hyuk LeeSe Yun KimJae Im Jeong김석준
Keywords
Transparent electrode; Transition metal dichalcogenide; Two-dimensional materials; NiTe2; Chemical exfoliation; Sputtering
Issue Date
2017-05
Publisher
Journal of alloys and compounds
Citation
VOL 704-613
Abstract
Transparent conductive NiTe2 electrodes have been fabricated via magnetron sputtering followed by chemical exfoliation. The freshly deposited NiTe2 thin films with thicknesses of 9 nm exhibited an electrical resistivity of 82 mu Omega cm and transparency of 53%, which were further increased by chemical exfoliation up to 289)162 mu Omega and 61% (70% at a wavelength of 285 nm), respectively. The thin films obtained by sputtering an intermetallic NiTe2 target were characterized by lower electrical resistivity as compared to that of the films fabricated by co-sputtering of Ni and Te targets, which could be attributed to the larger number of grains with the out-of-plane c-axis orientation.
URI
http://pubs.kist.re.kr/handle/201004/66322
ISSN
0925-8388
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE