High temperature isothermal oxidation behavior of NbSi2 coating at 1000-1450 oC

Title
High temperature isothermal oxidation behavior of NbSi2 coating at 1000-1450 oC
Authors
도정만홍경태윤진국김긍호최영준윤우영
Keywords
Intermetallics; SEM; TEM; XRD; Oxidation
Issue Date
2017-12
Publisher
Corrosion science
Citation
VOL 129-114
Abstract
Isothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000– 1450 °C. Oxidation rate of NbSi2 coating increased with temperature at 1000– 1300 °C but opposite trend was observed at 1300– 1450 °C. Maximum oxidation rate was obtained at 1300 °C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 °C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO2. Oxidation resistance of NbSi2 coating at these temperatures was governed by some inter-related factors.
URI
http://pubs.kist.re.kr/handle/201004/66768
ISSN
0010-938X
Appears in Collections:
KIST Publication > Article
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