Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns

Title
Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns
Authors
한상수여병철Ho-jin Kim윤창모서승기양준영윤종근유충근이용백이수정명재민이한보람김우희오일권김형준
Keywords
Atomic layer deposition; Al2O3; Self-assembled monolayer; Molecualar dynamics
Issue Date
2017-12
Publisher
ACS Applied Materials & Interfaces
Citation
VOL 9, NO 47-41617
URI
http://pubs.kist.re.kr/handle/201004/67009
ISSN
1944-8244
Appears in Collections:
KIST Publication > Article
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