Nanoporous metallic thin films prepared by dry processes

Title
Nanoporous metallic thin films prepared by dry processes
Authors
변지영김상훈쭝 히에우 쩐
Keywords
2018년 12월 입력으로 개인평가만 2019년에 반영
Issue Date
2018-10
Publisher
Journal of alloys and compounds
Citation
VOL 764-378
Abstract
Nanoporous Pt and Au thin films were prepared by dry etching methods and compared to those prepared by conventional wet etching (dealloying). While reactive ion etching (RIE) and deep RIE methods did not yield nanoporous structures with high roughness factors (<5), gentle XeF2 dry etching yielded thin metallic nanoporous films (~200 nm) with high enough roughness factors (~40). The nanoporous films were as good as those prepared by wet etching using 3% HF solution in terms of thickness and roughness factors. Sensing performance of nanoporous Pt films prepared by XeF2 dry etching was as good as that of wet-chemically dealloyed nanoporous Pt films for glucose sensing.
URI
http://pubs.kist.re.kr/handle/201004/69145
ISSN
0925-8388
Appears in Collections:
KIST Publication > Article
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