Microstructure of Carbon Film Deposited Using Hot-Filament Chemical Vapor Deposition

Title
Microstructure of Carbon Film Deposited Using Hot-Filament Chemical Vapor Deposition
Authors
이욱성백영준박종극권도현
Issue Date
2015-02
Publisher
대한금속 . 재료학회지; Korean journal of metals and materials
Citation
VOL 53, NO 2-109
Abstract
The microstructure of carbon film, deposited using hot-filament chemical vapor deposition, was investigated in relation to deposition pressure and methane concentration as deposition variables. Methane concentration in hydrogen gas was varied from 0.5 to 5% in volume. Deposition pressures were 5, 15, 45 and 75 Torr. Filament temperature and deposition temperature were fixed at 2100 ℃ and 950 ℃, respectively. With increasing methane concentration, the surface morphology changed its microstructure from microcrystalline diamond, to nanocrystalline diamond, to graphite. Raman spectroscopic analysis and X-ray diffraction analysis confirmed the bonding structures corresponding to each microstructure. At 5 Torr, the surface showed a fine grained morphology, different from the microstructures in the other pressure cases; however, the bonding nature also changed from diamond to graphite with increasing methane concentration.
URI
http://pubs.kist.re.kr/handle/201004/69829
ISSN
1738-8228
Appears in Collections:
KIST Publication > Article
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