Polybenzoxazole/graphene nanocomposite for etching hardmask

Title
Polybenzoxazole/graphene nanocomposite for etching hardmask
Authors
김선준신승욱김종선김대우정희태
Keywords
graphene oxide; patterning; etch resistance; hardmask; composite
Issue Date
2019-07
Publisher
Journal of industrial and engineering chemistry
Citation
VOL 75-303
Abstract
We demonstrate that graphene can enhance the etch resistance of polymeric hardmask significantly. Graphene oxide with a sub-micrometer diameter (nGO) was functionalized with fluorinated poly(hydroxyamide) (FPHA) via a chemical coupling reaction. The FPHA-functionalized-nGO can be dispersed in various organic solvents including methanol, cyclohexanone, dimethylformamide, and N-methyl pyrrolidone. In addition, the dispersions were spincoated to prepare hardmask films which were then thermally annealed to produce nRGO-fluorinated-polybenzoxazole (FPBO) film. Compared to pristine FPBO film, elastic modulus (122%), hardness (92%), and etch resistance (54%) were significantly enhanced at 17 wt.% graphene loading, surpassing the properties of commercial CHM009 film.
URI
http://pubs.kist.re.kr/handle/201004/70404
ISSN
1226-086X
Appears in Collections:
KIST Publication > Article
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