Round­robin test of medium­energy ion scattering for quantitative depth profiling of ultrathin HfO2/SiO2/Si films

Title
Round­robin test of medium­energy ion scattering for quantitative depth profiling of ultrathin HfO2/SiO2/Si films
Authors
채근화Won Ja MinGabriel MarmittLyudmila GoncharovaKenji KimuraTorgny GustafssonMatt CopelJungkyu KoHyung­Ik LeeSungho LeeJaap van den BergKagnwon JungKyungsu ParkIgor AlencarPedro L. GrandeDaeWon Moon
Keywords
electronic stopping power; HfO2 ultrahin film; MEIS; RRT
Issue Date
2019-07
Publisher
Surface and interface analysis : SIA
Citation
VOL 51, NO 7-721
URI
http://pubs.kist.re.kr/handle/201004/70851
ISSN
0142-2421
Appears in Collections:
KIST Publication > Article
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