UV-enhanced Atomic Layer Deposition of ZrO2 Thin Films at Room Temperature
- UV-enhanced Atomic Layer Deposition of ZrO2 Thin Films at Room Temperature
- 조상호; 이병훈; 황재권; 김수환; 성명모
- Issue Date
- Thin solid films
- VOL 518, NO 22-6436
- A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO2 thin films on poly (ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H2O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield uniform, conformal, and pure ZrO2 thin films on polymer substrates at room temperature. The UV light was very effective to obtain the high-quality ZrO2 thin films with good adhesive strength on polymer substrates. The ZrO2 thin films exhibit large-scale uniformity, sharp interfaces, and unique electrical properties.
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