Advanced Photoresist Technologies by Intricate Molecular Brush Architectures: Diblock brush terpolymer-based positive-tone photoresist materials

Title
Advanced Photoresist Technologies by Intricate Molecular Brush Architectures: Diblock brush terpolymer-based positive-tone photoresist materials
Authors
조상호Guorong SunFan YangXun HeAdriana Pavia-SandersCorrie ClarkJeffery E. RaymondStanislav V. VerkhoturovEmile A. SchweikertJames W. ThackerayPeter TrehonasKaren L. Wooley
Issue Date
2015-01
Publisher
Journal of polymer science Part A, Polymer chemistry
Citation
VOL 53, NO 2-199
URI
http://pubs.kist.re.kr/handle/201004/71173
ISSN
0887-624X
Appears in Collections:
KIST Publication > Article
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