Structural and electronic-structure investigations of defects in Cu-ion-implanted SnO2 thin films

Title
Structural and electronic-structure investigations of defects in Cu-ion-implanted SnO2 thin films
Authors
원성옥Devarani DeviPawan KulriyaFouran SinghSurekha ChaudharyHimani SaraswatHyun-Joon ShinJai ParkashAditya Sharma
Keywords
Thin films; XRD; NEXAFS; SnO2
Issue Date
2020-09
Publisher
Vacuum
Citation
VOL 179-109481-10
Abstract
SnO2 thin films have been deposited on Si substrates using RF-magnetron sputtering and implanted by 200 keV Cu? ions with ion fluence of 2.79 × 1016 ion/cm2 and 4 × 1016 ion/cm2. Post annealing is done on the pristine and Cu? ion-implanted SnO2 thin films. Samples were characterized using the grazing-incidence X-ray diffraction (GIXRD), field-emission scanning electron microscopy (FESEM) and near-edge X-ray absorption fine structure (NEXAFS). After the annealing, amorphous to crystalline phase transition and growth of particles are seen. It is also evidenced that Cu ions do not make metallic/oxide phases up to the implantation dose of 2.79 × 1016 ion/cm2. Cu L-edge NEXAFS has confirmed the Cu2+ ions in the samples. The O K-edge NEXAFS spectra of annealed films have shown diminished peak intensity of O 2p to Sn 5s hybridized orbitals which signify the O vacancy formation. A pre-edge peak in the O K-edge NEXAFS of Cu implanted films has evolved and confirms the additional hybridization of unoccupied Cu d orbitals with O 2p orbitals. The improved intensity of Sn M5,4-edge features is due to the enhanced crystallinity in annealed samples. Ion-solid interaction induced structural and electronic structure amendments are briefly discussed in the light of energy-loss mechanism.
URI
http://pubs.kist.re.kr/handle/201004/72484
ISSN
0042-207X
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