The characteristics of a-Si:H films as a function of H2/SiH4 ratio in EVR CVD

Title
The characteristics of a-Si:H films as a function of H2/SiH4 ratio in EVR CVD
Authors
강문상전법주임태훈오인환
Issue Date
1996-01
Publisher
IEEE international conference on microelectronics, Cario, Egypt.
URI
http://pubs.kist.re.kr/handle/201004/7651
Appears in Collections:
KIST Publication > Conference Paper
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