Characteristics of hydrogenated amorphous and recrystallized Si films with the variation of the substrate temperature in ECR plasma CVD.

Title
Characteristics of hydrogenated amorphous and recrystallized Si films with the variation of the substrate temperature in ECR plasma CVD.
Authors
강문상임태훈
Issue Date
1996-01
Publisher
37th annual meeting of the division of plasma physics, American physicsl society, Kentucky, USA
Citation
v. 40, no. 11, 1696-?
URI
http://pubs.kist.re.kr/handle/201004/7695
Appears in Collections:
KIST Publication > ETC
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