Characteristics of RuOx thin films as a sacrificial diffusion barrier for Cu metallization

Title
Characteristics of RuOx thin films as a sacrificial diffusion barrier for Cu metallization
Authors
김용태H. S. YoonC. S. KwonH. N. LeeJ. Jang민석기
Issue Date
1995-01
Publisher
한국물리학회 제71회 학술논문발표회
URI
http://pubs.kist.re.kr/handle/201004/7744
Appears in Collections:
KIST Publication > Conference Paper
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