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dc.contributor.author김용태-
dc.contributor.authorH. S. Yoon-
dc.contributor.authorC. S. Kwon-
dc.contributor.authorH. N. Lee-
dc.contributor.authorJ. Jang-
dc.contributor.author민석기-
dc.date.accessioned2015-12-02T02:56:16Z-
dc.date.available2015-12-02T02:56:16Z-
dc.date.issued199501-
dc.identifier.other4491-
dc.identifier.urihttp://pubs.kist.re.kr/handle/201004/7744-
dc.publisher한국물리학회 제71회 학술논문발표회-
dc.titleCharacteristics of RuOx thin films as a sacrificial diffusion barrier for Cu metallization-
dc.typeConference Paper-
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