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고밀도 압전 후막 및 그 제조 방법

Author

김태송; 천채일; 김용범

Assignee

한국과학기술연구원

Regitration Date

2004-02-19

Registration No.

0420929

Application Date

2001-05-26

Application No.

2001-0029272

Country

KO

URI

https://pubs.kist.re.kr/handle/201004/78546

Appears in Collections:

KIST Patent > 2001

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