Preparation of large area TiO2 thin films by low pressure chemical vapor deposition

Title
Preparation of large area TiO2 thin films by low pressure chemical vapor deposition
Authors
박달근전병수이중기신세희
Keywords
CVD; titanium dioxide; thin film
Issue Date
1994-01
Publisher
한국재료학회지
Citation
VOL 24, NO 8, 861-869
URI
http://pubs.kist.re.kr/handle/201004/7884
Appears in Collections:
KIST Publication > Article
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