Measurement of particle deposition velocity toward a horizontal semiconductor wafer by using a wafer surface scanner.

Title
Measurement of particle deposition velocity toward a horizontal semiconductor wafer by using a wafer surface scanner.
Authors
배귀남이춘식박승오
Keywords
particle deposition velocity; wafer; wafer surface scanner
Issue Date
1994-01
Publisher
Aerosol science and technology
Citation
v. 21, no. 1, 72-82
URI
http://pubs.kist.re.kr/handle/201004/8090
Appears in Collections:
KIST Publication > Article
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