Characterization of nitrogen-doped TiO2 thin films prepared by metalorganic chemical vapor deposition

Title
Characterization of nitrogen-doped TiO2 thin films prepared by metalorganic chemical vapor deposition
Authors
이동헌조용수이월인이전국정형진
Keywords
MOCVD; TiO2; 질소치환
Issue Date
1994-01
Publisher
한국요업학회지
Citation
VOL 31, NO 12, 1577-1587
URI
http://pubs.kist.re.kr/handle/201004/8171
Appears in Collections:
KIST Publication > Article
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