Catalytic chain length and characteristic curve in a chemical amplification photoresist using sulfonate photoacid generator.

Title
Catalytic chain length and characteristic curve in a chemical amplification photoresist using sulfonate photoacid generator.
Authors
안광덕양승관박찬언
Keywords
catalytic chain length; deep UV photoresists; photoacid generator; pyrogallol tris(methane sulfonate); t-BOC-protected phosphazene; dissolution inhibition; chemical amplification resist
Issue Date
1993-05
Publisher
폴리머; Polymer
Citation
v. 17, no. 3, 335-340
URI
http://pubs.kist.re.kr/handle/201004/8205
Appears in Collections:
KIST Publication > Article
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